| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing machine for a diamond material, which can polish a diamond at high speed with high surface precision. <P>SOLUTION: In the polishing machine to be used to polish a diamond, a polishing surface of the polishing machine, which abuts on the diamond, is formed of a material including an oxide at 50 vol% or more and having indentation hardness of 500 Kfg/cm<SP POS="POST">2</SP>or more. As the oxide, an oxide of one or more elements selected from a group of Si, Al, Ti, Cr and Zr is desirable. <P>COPYRIGHT: (C)2013,JPO&INPIT |
