| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for minimizing loss of transfer accuracy, and enhancement of operation rate in a lithography system. <P>SOLUTION: In a lithography system 1 including at least three lithography apparatus 10a, 10b, 10c, at least two lithography apparatus comprise: an acquisition unit 22 which acquires a transfer function representing the relation of the first vibration generated in one lithography apparatus by movement of a substrate stage thereof, and a second vibration generated in the other lithography apparatus when the first vibration is transmitted thereto; a calculation unit 24 which calculates the amount of vibration of the first lithography apparatus due to movement of the substrate stage in one of the three lithography apparatus excepting the first lithography apparatus based on the transfer function; and a control unit 26 which controls movement of the substrate stage in an apparatus excepting the first lithography apparatus so that the amount of vibration calculated goes below an allowable amount. <P>COPYRIGHT: (C)2013,JPO&INPIT |
