发明名称 SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a normally-off field-effect transistor with a low on-resistance. <P>SOLUTION: A semiconductor device includes: an electron transit layer 11 formed on a substrate 10; an electron supply layer 12 formed on the electron transit layer 11 by a semiconductor having a bandgap wider than that of the electron transit layer 11; a barrier formation layer 13 formed on the electron supply layer 12 by a semiconductor having a bandgap narrower than that of the electron supply layer 12; an upper channel layer 14 formed on the barrier formation layer 13 by a semiconductor with doped impurities; lateral faces of the barrier formation layer 13 and the upper channel layer 14 that are formed by removing the barrier formation layer 13 and the upper channel layer 14; an insulating film 20 formed on the lateral faces; a gate electrode 21 formed via the insulating film 20; a source electrode 22 connected with the upper channel layer 14; and a drain electrode 23 connected with the electron supply layer 12 or the electron transit layer 11. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013055148(A) 申请公布日期 2013.03.21
申请号 JP20110190999 申请日期 2011.09.01
申请人 FUJITSU LTD 发明人 TSUNENOBU KAZUKIYO
分类号 H01L21/338;H01L21/28;H01L21/336;H01L29/41;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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