Optical system for wafer inspection system for detecting wafer defects or impurities, comprises polarization beam splitter, and transmissive optical element that causes rotation of polarization device by linear polarized light

摘要

The optical system comprises a polarization beam splitter (12), a transmissive optical element (15) and an arrangement for generating magnetic field in the area of the transmissive optical element. The transmissive optical element causes rotation of the polarization device by a linear polarized light reflecting on the polarization beam splitter due to Faraday rotation taking place in the transmissive optical element during operation of the wafer inspection system. A polarization influencing arrangement (10) is provided in the light propagation direction before the polarization beam splitter. An independent claim is included for a method for operating a wafer inspection system.