SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a technology capable of processing a large-sized processing substrate for a substrate processing apparatus that processes a substrate by using light.

SOLUTION: A substrate processing apparatus comprises: a processing chamber for processing a substrate: a substrate loading part provided in the processing chamber and horizontally rotating in a state of loading a substrate; a light generation part provided outside the processing chamber so as to face the substrate loaded on the substrate loading part for radiating light into the processing chamber; a partition part provided between the processing chamber and the light generation part for separating the processing chamber and the light generation part; a processing gas supply part supplying a processing gas into the processing chamber; and an exhaust part exhausting an atmosphere in the processing chamber. The partition part includes a plurality of transmission windows transmitting light irradiated from the light generation part into the processing chamber and window fixing parts provided between the transmission windows for fixing the transmission windows. An area of at least one transmission window among the plurality of transmission windows is set at an area smaller than a substrate area.

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