| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for producing a resist pattern with a superior exposure margin, and to provide a novel salt included in the resist composition. <P>SOLUTION: The salt is expressed by formula (I). The resist composition comprises the salt and a resin insoluble or substantially insoluble with an alkali aqueous solution and converted into soluble with an alkali aqueous solution by an action of an acid. In formula (I), Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>represent a fluorine atom or the like; X<SP POS="POST">1</SP>and X<SP POS="POST">2</SP>represent a single bond, an aliphatic saturated hydrocarbon group or the like; A<SP POS="POST">1</SP>represents a 1-30C organic group; and Z<SP POS="POST">+</SP>represents an organic cation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
