| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical liquid processing apparatus in which increase in size is suppressed, and liquid dripping is well done with no accumulation of chemical liquid on a substrate. <P>SOLUTION: The apparatus includes a substrate transportation part (51) which transports a band-like substrate (1) in a length direction (DR1), and while the substrate (1) is being transported, a chemical liquid (LQ) sticking on its upper surface (1u) is caused to drip. The substrate transportation part (51) includes a roller set consisting of an upper roller and a lower roller which transport the substrate (1) by pinching from above and below, as first to third roller sets (R3-R5), in a length direction (AR1) in this order. Related to the pinching position for pinching the substrate (1) with the upper roller and the lower roller, a pinching position (KP4) of the second roller set (R4) is lower than pinching positions (KP3 and KP5) of the first and third roller sets. <P>COPYRIGHT: (C)2013,JPO&INPIT |
