发明名称 SCANNING ELECTRON MICROSCOPE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and a device of observing or measuring a specimen at high speed with high accuracy while limiting the impact of beam diameter increase of an electron beam due to image shift. <P>SOLUTION: When scanning a region smaller than a predetermined scanning width with an electron beam, scrolling is performed using image shift when a target irradiation position of the electron beam on a specimen is within a second range smaller than a first range capable of controlling the image shift, otherwise stage movement is performed. Since the scrolling amount can be increased by relative image shift for stage movement under conditions not affected by the beam diameter, observation and measurement of a specimen can be carried out at high speed with high accuracy. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013054908(A) 申请公布日期 2013.03.21
申请号 JP20110192266 申请日期 2011.09.05
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 DOI TAKASHI;KOMURO OSAMU;SHIRAI MASUMI
分类号 H01J37/147;H01J37/22 主分类号 H01J37/147
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