Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
摘要
申请公布号
EP2261698(B1)
申请公布日期
2013.03.20
申请号
EP20100181596
申请日期
2006.04.26
申请人
ASML NETHERLANDS BV
发明人
VAN HERPEN, MAARTEN;BAKKER, LEVINUS;BANINE, VADIM;KLUNDER, DERK
