发明名称 |
Lithographic apparatus having a substrate support with open cell plastic foam parts |
摘要 |
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate support includes parts that are made of an open cell plastic foam material. |
申请公布号 |
US8400617(B2) |
申请公布日期 |
2013.03.19 |
申请号 |
US20100730901 |
申请日期 |
2010.03.24 |
申请人 |
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;BIJVOET DIRK-JAN;EUSSEN EMIEL JOZEF MELANIE;AARTS IGOR MATHEUS PETRONELLA;ASML NETHERLANDS B.V. |
发明人 |
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;BIJVOET DIRK-JAN;EUSSEN EMIEL JOZEF MELANIE;AARTS IGOR MATHEUS PETRONELLA |
分类号 |
G03B27/58;G03B27/42;G03B27/62 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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