| 摘要 |
PURPOSE: A pellicle for lithography and a manufacturing method thereof are provided to prevent troubles caused by the deterioration of a mask adhesive and the generation of gas by minimizing light exposure. CONSTITUTION: A pellicle for lithography consists of a pellicle film(3), a pellicle frame(1), an adhesive layer for attaching the pellicle film, and a mask adhesive layer. The adhesive layer for attaching the pellicle film is formed on one side of the pellicle frame. The mask adhesive layer is formed on the end side which is formed in the opposite side of the adhesive for attaching the pellicle film. The cross section of the mask adhesive layer is rectangular or trapezoidal. The angle of the side of the mask adhesive layer to the frame side is below 90 degrees. [Reference numerals] (a) Angle of sidewalls; (AA) Expanded |
