发明名称 Methods of forming radiation-hardened semiconductor structures
摘要 A radiation-hardened semiconductor structure including an insulator material doped with at least one of a transition metal, a lanthanide, and an actinide, and a semiconductor material located over the insulator material. A semiconductor device including the radiation-hardened semiconductor structure is also disclosed, as are methods of forming the radiation-hardened semiconductor structure and the semiconductor device.
申请公布号 US8399312(B2) 申请公布日期 2013.03.19
申请号 US20100844684 申请日期 2010.07.27
申请人 CANHAM JOHN S.;ALLIANT TECHSYSTEMS INC. 发明人 CANHAM JOHN S.
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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