发明名称 |
Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device |
摘要 |
A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.
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申请公布号 |
US8400612(B2) |
申请公布日期 |
2013.03.19 |
申请号 |
US20100793873 |
申请日期 |
2010.06.04 |
申请人 |
YAMAMOTO KAZUKI;OHSAKI YOSHINORI;CANON KABUSHIKI KAISHA |
发明人 |
YAMAMOTO KAZUKI;OHSAKI YOSHINORI |
分类号 |
G03B27/68 |
主分类号 |
G03B27/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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