Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters

摘要

The invention provides a process for coating workpieces by plasma-induced chemical vapor deposition, in which a process gas is introduced into a coating chamber and a plasma is ignited by electromagnetic energy in at least one region of the coating chamber which adjoins the workpiece and in which the process gas is present, wherein the coating operation is monitored on the basis of at least one measured spectral parameter of the plasma, and the workpiece is removed in the event of a deviation from a desired range for the parameter.