| 摘要 |
PURPOSE: A substrate processing apparatus, a substrate processing method and a storage medium are provided to improve the drying efficiency of a substrate. CONSTITUTION: A cleaning process part(62) includes a cleaning bath(69) for cleaning solution. A drying process part(61) is installed in the upper part of the cleaning bath. A drying process is performed on a substrate in a drying chamber(65). A temperature sensor measures the temperature of the drying chamber. A temperature control gas supply device supplies heating gas or cooling gas to the drying chamber. [Reference numerals] (AA) Compulsory exhaust; (BB) Natural exhaust; (CC,EE) Liquid exhaust; (DD) Gas exhaust |
