| 摘要 |
PURPOSE: A device for inspecting upper layer patterns of an improve multilayer structure, a system, and a method thereof are provided to utilize a difference of ultraviolet radiation amount of the upper layer electrode patterns and an insulating layer, thereby inspecting upper layer patterns accurately and precisely. CONSTITUTION: A device(200) for inspecting upper layer patterns of an improve multilayer structure comprises an optical member(210), an ultraviolet-ray LED lighting member(220), and a camera(230). The ultraviolet-ray LED lighting member emits ultraviolet-rays. The ultraviolet-ray LED lighting member includes an illumination control member(250). The camera is arranged on the top of the optical member.
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