PURPOSE: A substrate bonding apparatus is provided to improve direct bonding efficiency by transmitting a uniform load to two substrates. CONSTITUTION: A support unit(110) supports a silicon substrate(10) and a GaN substrate(20) and is transformed to contact the silicon substrate. The support unit includes a support unit body(111) with a first concave part(111a), a first floating layer(112), and a first flexible thin film layer(113). A pressurizing unit(120) reciprocates toward the support unit to apply a bonding load to the silicon substrate and the GaN substrate. The pressurizing unit is transformed to contact the GaN substrate. The pressurizing unit includes a support body(121) with a second concave part(121a), a second floating layer(122), and a second flexible thin film layer(123).
申请公布号
KR20130027182(A)
申请公布日期
2013.03.15
申请号
KR20110090605
申请日期
2011.09.07
申请人
SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
发明人
KIM, DONG HYUN;WOO, KWANG JE;HAN, YOU SHIN;SHUR, JOONG WON;LEE, BO HYUN;KIM, MIN JU;JANG, BONG HEE;PARK, SEUNG YONG;YU, YULIA;KIM, DONG WOON;KIM, MI KYOUNG