| 摘要 |
PURPOSE: A substrate processing apparatus is provided to increase a lifetime of a shower head by preventing ions generated by the plasma of process gas in a chamber from directly colliding with the shower head. CONSTITUTION: A top electrode(10) is located on the upper side of the inside of a chamber(1) and is composed of a shower head body(10a) and a shower head. The shower head includes a floating shower head(200) in contact with plasma in the chamber and a floating ground shower head(12) installed in the floating shower head. A bottom electrode(20) is arranged on the lower side of the top electrode and mounts a substrate. A magnetic circuit unit includes a magnetic bar with a preset length. An N pole and an S pole are vertically formed on the magnetic bar.
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