| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique which efficiently transports substrates and thereby improving the throughput of the substrate process. <P>SOLUTION: A substrate processing apparatus 100 processes substrates 9. The substrate processing apparatus 100 includes: a substrate receiving part 1 receiving the substrates from the exterior; an application part 2 applying a process liquid to the substrates 9; a dry part 3 drying the substrates 9 to which the process liquid is applied; and a substrate ejection part 4 ejecting the substrates 9 to the exterior. Further, the substrate process apparatus 100 includes a transport mechanism 5 simultaneously transporting the multiple substrates 9 in the substrate receiving part 1 to the application part 2, a transport mechanism 6 simultaneously transporting the multiple substrates 9, which the process liquid is applied in the application part 2, to the dry part 3, and a transport mechanism 7 simultaneously transporting the multiple substrates 9 dried in the dry part 3 to the substrate ejection part 4. <P>COPYRIGHT: (C)2013,JPO&INPIT |
