发明名称 HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING
摘要 A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system.
申请公布号 US2013061878(A1) 申请公布日期 2013.03.14
申请号 US201213670217 申请日期 2012.11.06
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED 发明人 WALLACE JAY R.;HAMELIN THOMAS
分类号 B08B3/08 主分类号 B08B3/08
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