发明名称 |
HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING |
摘要 |
A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system. |
申请公布号 |
US2013061878(A1) |
申请公布日期 |
2013.03.14 |
申请号 |
US201213670217 |
申请日期 |
2012.11.06 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED |
发明人 |
WALLACE JAY R.;HAMELIN THOMAS |
分类号 |
B08B3/08 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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