| 摘要 |
<p>This substrate processing device forms a pattern for a mask on a substrate surface to be processed. The substrate processing device is provided with: a mask holding unit that is formed in a cylindrical shape, holds a mask along the cylindrical surface, and is rotatable around a prescribed axial line; a substrate holding unit that holds the substrate surface to be processed, maintaining a prescribed gap with the cylindrical surface of the mask and in a prescribed shape around the axial line; and a projection optical system that is disposed between the mask and the substrate and projects an image of a pattern on the substrate. The projection optical system has a plurality of image forming optical elements that form an image of part of the mask pattern on part of the substrate and is arranged in both the direction in which the axial line extends and the circumferential direction around the axial line. Each of the image forming optical elements arranged in the circumferential direction around the axial line is provided such that an image forming optical path is formed along a radial direction with the axial line as the center.</p> |
