发明名称 |
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition comprising: a base component (A) which exhibits changed solubility in a developing solution under action of acid; an acid-generator component (B) which generates acid upon exposure; and a compound (D1) including of a cation moiety which contains a quaternary nitrogen atom, and an anion moiety represented by formula (d1-an1) or (d1-an2) shown below. In the formulas, X represents a cyclic aliphatic hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent. |
申请公布号 |
US2013065180(A1) |
申请公布日期 |
2013.03.14 |
申请号 |
US201213605338 |
申请日期 |
2012.09.06 |
申请人 |
KUROSAWA TSUYOSHI;ENDO KOTARO;IWASAWA YUTA;KOMURO YOSHITAKA;KAWAUE AKIYA;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KUROSAWA TSUYOSHI;ENDO KOTARO;IWASAWA YUTA;KOMURO YOSHITAKA;KAWAUE AKIYA |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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