发明名称 |
MODIFIED POLYSILAZANE FILM AND METHOD FOR PRODUCING GAS BARRIER FILM |
摘要 |
Provided are: a modified polysilazane film which is suitable as an intermediate material for forming a specific gas barrier film; and a method for producing a gas barrier film having excellent gas barrier characteristics, said gas barrier film using the modified polysilazane film as an intermediate material. A modified polysilazane film which is obtained by forming a modified polysilazane layer on a base; and a method for producing a gas barrier film using such an intermediate material, wherein the thickness of the modified polysilazane layer is set to a value within the range of 10-500 nm and the refractive index of the modified polysilazane layer is set to a value within the range of 1.48-1.63. |
申请公布号 |
WO2013035432(A1) |
申请公布日期 |
2013.03.14 |
申请号 |
WO2012JP67773 |
申请日期 |
2012.07.12 |
申请人 |
LINTEC CORPORATION;NAGANAWA SATOSHI;SUZUKI YUTA |
发明人 |
NAGANAWA SATOSHI;SUZUKI YUTA |
分类号 |
B32B9/00;C08J3/28;C08J7/04 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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