发明名称 MODIFIED POLYSILAZANE FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
摘要 Provided are: a modified polysilazane film which is suitable as an intermediate material for forming a specific gas barrier film; and a method for producing a gas barrier film having excellent gas barrier characteristics, said gas barrier film using the modified polysilazane film as an intermediate material. A modified polysilazane film which is obtained by forming a modified polysilazane layer on a base; and a method for producing a gas barrier film using such an intermediate material, wherein the thickness of the modified polysilazane layer is set to a value within the range of 10-500 nm and the refractive index of the modified polysilazane layer is set to a value within the range of 1.48-1.63.
申请公布号 WO2013035432(A1) 申请公布日期 2013.03.14
申请号 WO2012JP67773 申请日期 2012.07.12
申请人 LINTEC CORPORATION;NAGANAWA SATOSHI;SUZUKI YUTA 发明人 NAGANAWA SATOSHI;SUZUKI YUTA
分类号 B32B9/00;C08J3/28;C08J7/04 主分类号 B32B9/00
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