THERMAL DEPOSITION APPARATUS

摘要

The present invention relates to a thermal deposition apparatus that reduces the rate of deposition variation using a plate-shaped metal heater instead of an existing tungsten filament or molybdenum boat, and more particularly, to a thermal deposition apparatus which uses a plate-shaped metal heater installed parallel to a processing axis of a substrate, and which uses a carrier positioned on the front surface of the plate-shaped metal heater. By using the thermal deposition apparatus of the present invention, the efficiency of use of deposited materials can be improved, and the deposited materials can be deposited on the substrate in a uniform and reproducible manner.