发明名称 SEMICONDUCTOR MEMORY AND MANUFACTURING METHOD OF THE SAME
摘要 According to one embodiment, a semiconductor memory includes a memory cell in a memory cell array which is provided in a semiconductor substrate and which includes a first active region surrounded by a first isolation insulator, a transistor in a transistor region which is provided in the semiconductor substrate and which includes second active regions surrounded by a second isolation insulator. The second isolation insulator includes a first film, and a second film between the first film and the second active region, and the upper surface of the first film is located closer to the bottom of the semiconductor substrate than the upper surface of the second film.
申请公布号 US2013062680(A1) 申请公布日期 2013.03.14
申请号 US201213413952 申请日期 2012.03.07
申请人 KATO YOSHIKO;ENDO MASATO;NODA MITSUHIKO;NOGUCHI MITSUHIRO 发明人 KATO YOSHIKO;ENDO MASATO;NODA MITSUHIKO;NOGUCHI MITSUHIRO
分类号 H01L27/105;H01L21/8239 主分类号 H01L27/105
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