发明名称 |
LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION |
摘要 |
A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.
|
申请公布号 |
US2013063803(A1) |
申请公布日期 |
2013.03.14 |
申请号 |
US201113227586 |
申请日期 |
2011.09.08 |
申请人 |
DELGADO GILDARDO;WACK DANIEL;KLA-TENCOR CORPORATION |
发明人 |
DELGADO GILDARDO;WACK DANIEL |
分类号 |
G02F1/25 |
主分类号 |
G02F1/25 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|