发明名称 |
METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK |
摘要 |
The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) combining the first, the second and the third data. |
申请公布号 |
WO2013010976(A3) |
申请公布日期 |
2013.03.14 |
申请号 |
WO2012EP63881 |
申请日期 |
2012.07.16 |
申请人 |
CARL ZEISS SMS GMBH;BUDACH, MICHAEL;BRET, TRISTAN;EDINGER, KLAUS;HOFMANN, THORSTEN |
发明人 |
BUDACH, MICHAEL;BRET, TRISTAN;EDINGER, KLAUS;HOFMANN, THORSTEN |
分类号 |
G03F1/22;G03F1/84;G03F1/86 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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