| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve particle removal efficiency in a substrate processing method and a substrate processing apparatus for removing contaminants, such as particles, which adhere to a substrate surface. <P>SOLUTION: A liquid film LP, formed by a process liquid L where polystyrene fine particles P are dispersed in deionized water, is formed on a surface Wf of a substrate W. The substrate process apparatus allows a cooling gas discharge nozzle 3 to sweep and move relative to the substrate W while discharging a cooling gas to freeze the liquid film LP. The fine particles P mixed into the liquid film becomes a solidification core and the generation of an ice block IC is facilitated. Thus, the phase change time from the liquid phase to the solid phase is shortened and the particle removal efficiency is improved. <P>COPYRIGHT: (C)2013,JPO&INPIT |
