发明名称 PLASMA GENERATION DEVICE, CVD DEVICE AND PLASMA TREATMENT PARTICLE GENERATION DIVICE
摘要 <p>The present invention provides a plasma generation device wherein even if a source gas is supplied in a housing in which an electrode cell is disposed, no problem occurs such as corrosion on a power supply unit and an electrode surface disposed in the housing and the deposit of metal inside the housing except for the discharger of the electrode cell. A plasma generation device (100) according to the present invention includes an electrode cell and a housing (16) that surrounds the electrode cell. The electrode cell has a first electrode (3), a second electrode (1) facing the first electrode (3) via discharging space (6), and dielectrics (2a, 2b) arranged on the principal surface of each electrode (1, 3). Further, the plasma generation device (100) is provided with a pipeline (75) for directly supplying the source gas from the outside of the housing (16) to the discharging space (6) without being connected to the space inside the housing (16) where no electrode cell is disposed.</p>
申请公布号 WO2013035377(A1) 申请公布日期 2013.03.14
申请号 WO2012JP60846 申请日期 2012.04.23
申请人 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION;TABATA YOICHIRO;WATANABE KENSUKE 发明人 TABATA YOICHIRO;WATANABE KENSUKE
分类号 H05H1/24;C23C16/452;C23C16/505;H01L21/31 主分类号 H05H1/24
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