发明名称 |
METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE |
摘要 |
Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. |
申请公布号 |
US2013064977(A1) |
申请公布日期 |
2013.03.14 |
申请号 |
US201113577922 |
申请日期 |
2011.02.11 |
申请人 |
VERMEER ADRIANUS JOHANNES PETRUS MARIA;ROOZEBOOM FREDDY;VAN DEELEN JOOP;NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETEN SCHAPPELIJK ONDERZOEK TNO |
发明人 |
VERMEER ADRIANUS JOHANNES PETRUS MARIA;ROOZEBOOM FREDDY;VAN DEELEN JOOP |
分类号 |
C23C16/455;C23C16/458 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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