SUBSTRATE PROCESSING DEVICE

摘要

This substrate processing device forms a pattern on the surface to be treated of a substrate and is provided with: a hollow mask holding part that is rotatable about an axis of rotation and holds a mask in which a pattern is formed; a control device that controls the rotation of the mask holding part and also controls the transporting of substrates; and an optical system which forms the pattern on the substrate and has an optical member that is disposed within the mask holding part and deflects the light that has come via the pattern within the mask holding part.