METHOD FOR MANUFACTURING IMPRINT MOLD, AND RESIST DEVELOPING DEVICE

摘要

The present invention provides a method for manufacturing an imprint mold that can suppress temperature variations in a developing fluid supplied to a substrate to be processed and stably carry out processing of the substrate to be processed along with supplying the developing fluid and also provides a resist developing device. This resist developing device is characterized by being provided with: a retention unit (4) that retains a developing fluid (11) controlled in a constant temperature state; a holding unit (8) that holds a substrate to be processed (6); a supply pipe (5) that forms a flow path for the developing fluid retained in the retention unit to flow in, has a discharge unit (14) that discharges the developing fluid flowing along this flow path, and supplies the developing fluid to the substrate to be processed by discharging the developing fluid from the discharge unit towards the substrate to be processed, which is held by the holding unit; and a variation unit that executes a first variable operation that varies the discharge direction of the discharge unit to a non-arriving direction such that the developing fluid discharged from the discharge unit of the supply pipe does not reach the substrate to be processed and a second variable operation that varies the discharge direction of the discharge unit to an arrival direction such that the developing fluid discharged from the discharge unit of the supply pipe arrives at the substrate to be processed.