发明名称 FORMING AN OXIDE LAYER ON A FLAT CONDUCTIVE SURFACE
摘要 A method and apparatus for electrochemically forming an oxide layer on a flat conductive surface which involves positioning a working electrode bearing the flat conductive surface in opposed parallel spaced apart relation to a flat conductive surface of a counter electrode such that the flat conductive surface of the working electrode and the flat conductive surface of the counter electrode are generally opposed, horizontally oriented, and define a space therebetween. A volume of organic electrolyte solution containing chemicals for forming the oxide layer on the flat conductive surface of the working electrode is arranged to flood the flat conductive surface of the counter electrode surface and to occupy the space defined between the flat conductive surface of the working electrode and the flat conductive surface of the counter electrode such that at least the flat conductive surface of the counter electrode is in contact with the organic electrolyte solution and substantially only the flat conductive surface of the working electrode is in contact with the organic electrolyte solution. An electric current flows between substantially only the flat conductive surface of the counter electrode and substantially only the flat conductive surface of the working electrode, in the organic electrolyte solution, for a period of time and at a magnitude sufficient to cause the chemicals to form the oxide layer on the flat conductive surface of the working electrode.
申请公布号 CA2848103(A1) 申请公布日期 2013.03.14
申请号 CA20112848103 申请日期 2011.09.08
申请人 CLEAR METALS INC. 发明人 RUBIN, LEONID BORISOVICH;OSIPOV, ALEXANDER SERGEYEVICH;NEBURCHILOVA, ELENA BORISOVNA
分类号 H01L21/306;C25D7/12;C25D9/00;H01L21/288;H01L31/18 主分类号 H01L21/306
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