| 摘要 |
A laser beam irradiation apparatus irradiates a laser beam onto a sealing unit disposed between a first substrate and a second substrate so as to seal the first substrate and the second substrate. The laser beam has a beam intensity which increases from a center portion to an edge portion of the laser beam on a surface which is perpendicular to a proceeding direction of the laser beam. The beam intensity at the center portion of the laser beam is half of the beam intensity at the edge portion of the laser beam or less, and the laser beam has a beam profile which is symmetrical relative to the proceeding direction of the laser beam. |
