发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND SPACER
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which achieves both elastic recovery characteristics and adhesiveness, and can form a fine spacer. <P>SOLUTION: An alkaline developable photosensitive resin composition contains a hydrophilic resin (A), a polyfunctional (meth)acrylate (B), a radical trapping agent (C), a photopolymerization initiator (D) and a metal element containing compound (E) as essential components, and has an energy difference between the lowest unoccupied molecular orbital of (C) and the highest occupied molecular orbital of (D) of 11.5 eV or less. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013050712(A) 申请公布日期 2013.03.14
申请号 JP20120167947 申请日期 2012.07.30
申请人 SANYO CHEM IND LTD 发明人 TANABE FUMIYUKI;YAMASHITA MAYUKO;YAMASHITA TAIJI
分类号 G03F7/004;G03F7/027 主分类号 G03F7/004
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