发明名称 PATTERN TRANSFER DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To extend the life of a template which is used in imprinting. <P>SOLUTION: A pattern transfer device includes a transfer position selection unit 11 which, when a pattern transfer from a template TM, which is divided into N transfer regions (N=integer equal to or greater than 2) corresponding to chip regions on a wafer to which to be transferred, to a wafer W is performed a number of times, selects one or more but not exceeding (N-1) of transfer regions which will be used when a transfer is made to peripheral regions on the wafer W corresponding to part of the N transfer regions in such a way as to ensure that the number of times a transfer is made to the N transfer regions will be equalized; and a transfer sequence setting unit 12 which sets the order in which a pattern transfer to the wafer W is performed a number of times so that transfer regions which were left unselected when one or more but not exceeding (N-1) of transfer regions were selected will not collide the transfer-finished regions of the wafer W. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013051359(A) 申请公布日期 2013.03.14
申请号 JP20110189465 申请日期 2011.08.31
申请人 TOSHIBA CORP 发明人 KOBAYASHI YUJI
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
代理机构 代理人
主权项
地址