发明名称 RADICAL CURABLE COMPOSITION FOR WAFER LEVEL LENS
摘要 <P>PROBLEM TO BE SOLVED: To provide a radical curable composition for a wafer level lens which is excellent in optical characteristics and can form a cured article having extremely excellent form retention properties even under a high temperature environment. <P>SOLUTION: The radical curable composition for the wafer level lens includes the following radical curable compound (A) as a radical curable compound. The radical curable compound (A) is a compound expressed by formula (1). (In the formula, R<SP POS="POST">1</SP>is a single bond, a methylene group in which one or two of hydrogen atoms may be substituted by a 1-5C alkyl group, a sulfonyl group, a sulfur atom or an oxygen atom; R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>are the same or different, and express each a hydrogen atom or a methyl group; X and X' are the same or different, and express each a sulfur atom or an oxygen atom; R and R' are the same or different, and express each a 1-5C alkyl group; and n and n' are the same or different, and express each 0 or 1). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013049823(A) 申请公布日期 2013.03.14
申请号 JP20110209262 申请日期 2011.09.26
申请人 DAICEL CORP 发明人 KUBO TAKASHI;FUJIKAWA TAKESHI;KISHIMOTO MAKI
分类号 C08F20/10;C08F2/44;G02B1/04;G02B3/00 主分类号 C08F20/10
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