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发明名称
Delta monolayer dopants epitaxy for embedded source/drain silicide
摘要
申请公布号
GB2494608(A)
申请公布日期
2013.03.13
申请号
GB20130000789
申请日期
2011.06.10
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
KEVIN K CHAN;ABHISHEK DUBE;JUDSON R HOLT;JEFFREY B JOHNSON;JINGHONG LI;DAE-GYU PARK;ZHENGMAO ZHU
分类号
H01L29/78;H01L29/165;H01L29/66
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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