| 发明名称 |
A PROCESS FOR MAKING SEMICONDUCTOR DEVICES HAVING MINIMUM SURFACE UNEVENESS,AND SEMICONDUCTOR DEVICES PRODUCED BY SAID PROCESS |
| 摘要 |
|
| 申请公布号 |
IL35015(D0) |
申请公布日期 |
1970.09.17 |
| 申请号 |
IL19700035015 |
申请日期 |
1970.07.28 |
| 申请人 |
SOC GENERALE SEMICONDUTTORI SPA SGS |
发明人 |
|
| 分类号 |
H01L21/00;H01L21/32;H01L21/762 |
主分类号 |
H01L21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
