,申请号JP20100096638-传众专利搜索

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法人/股东/高管

发明名称
摘要	In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
申请公布号	JP5161261(B2)	申请公布日期	2013.03.13
申请号	JP20100096638	申请日期	2010.04.20
申请人		发明人
分类号	H01L21/027;G03F7/20	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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