| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus capable of measuring the impedance of plasma. <P>SOLUTION: A measurement chamber 12 is connected to a vacuum tank 11, and probes 31 and 32 are disposed in the measurement chamber 12. The vacuum tank 11 is provided with a plurality of plasma generating devices 16, a shutter 35 between the vacuum tank 11 and measurement chamber 12 is opened, one plasma generating device 16 is selected and applied with a high-frequency voltage to generate plasma in the vacuum tank 11, and while the generated plasma is used as a load, measurement signals are applied from the probes 31 and 32 to determine the impedance of the plasma. Impedance matching can be performed by plasma generating devices 16. When a vacuum treatment is carried out, the shutter 35 can be held closed, and the probes 31 and 32 are not damaged by plasma of a treating gas such as an etching gas. <P>COPYRIGHT: (C)2009,JPO&INPIT |
