| 发明名称 |
Illumination system for a microlithographic projection exposure apparatus |
| 摘要 |
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
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| 申请公布号 |
US8395756(B2) |
申请公布日期 |
2013.03.12 |
| 申请号 |
US20080190308 |
申请日期 |
2008.08.12 |
| 申请人 |
WANGLER JOHANNES;SIEKMANN HEIKO;WEIBLE KENNETH;SCHARNWEBER RALF;MAUL MANFRED;DEGUENTHER MARKUS;LAYH MICHAEL;SCHOLZ AXEL;SPENGLER UWE;VOELKEL REINHARD;CARL ZEISS SMT GMBH |
发明人 |
WANGLER JOHANNES;SIEKMANN HEIKO;WEIBLE KENNETH;SCHARNWEBER RALF;MAUL MANFRED;DEGUENTHER MARKUS;LAYH MICHAEL;SCHOLZ AXEL;SPENGLER UWE;VOELKEL REINHARD |
| 分类号 |
G03B27/32;G03B27/42;G03B27/54;G03B27/72 |
主分类号 |
G03B27/32 |
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