发明名称 |
Adaptive nanotopography sculpting |
摘要 |
Adaptive imprint planarization provides a surface having desired shape characteristics. Generally, topography of a first surface is mapped to provide a density map. The density map is evaluated to provide a drop pattern for dispensing polymerizable material on the first surface. The polymerizable material is solidified and etched to provide a second surface having the desired shape characteristics. Additionally, adaptive imprint planarization compensates for parasitic effects of the imprinting process. |
申请公布号 |
US8394282(B2) |
申请公布日期 |
2013.03.12 |
申请号 |
US20090479200 |
申请日期 |
2009.06.05 |
申请人 |
PANGA AVINASH;SREENIVASAN SIDLGATA V.;BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
PANGA AVINASH;SREENIVASAN SIDLGATA V. |
分类号 |
C23F1/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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