发明名称 |
In-situ cleaning of an imprint lithography tool |
摘要 |
Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate. |
申请公布号 |
US8394203(B2) |
申请公布日期 |
2013.03.12 |
申请号 |
US20090563356 |
申请日期 |
2009.09.21 |
申请人 |
SCHMID GERARD M.;MCMACKIN IAN MATTHEW;CHOI BYUNG-JIN;RESNICK DOUGLAS J.;MOLECULAR IMPRINTS, INC. |
发明人 |
SCHMID GERARD M.;MCMACKIN IAN MATTHEW;CHOI BYUNG-JIN;RESNICK DOUGLAS J. |
分类号 |
B08B5/00 |
主分类号 |
B08B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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