发明名称 In-situ cleaning of an imprint lithography tool
摘要 Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
申请公布号 US8394203(B2) 申请公布日期 2013.03.12
申请号 US20090563356 申请日期 2009.09.21
申请人 SCHMID GERARD M.;MCMACKIN IAN MATTHEW;CHOI BYUNG-JIN;RESNICK DOUGLAS J.;MOLECULAR IMPRINTS, INC. 发明人 SCHMID GERARD M.;MCMACKIN IAN MATTHEW;CHOI BYUNG-JIN;RESNICK DOUGLAS J.
分类号 B08B5/00 主分类号 B08B5/00
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