发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
摘要 PURPOSE: A substrate processing apparatus, a substrate processing method and a storage medium are provided to improve the process efficiency for substrates by using only the normal nozzle for a liquid process. CONSTITUTION: A liquid process unit(2) includes nozzles and a liquid process module(20). A transfer unit(4) moves a substrate to a process block. A monitoring unit detects the discharging state of the nozzles. A control unit selects normal nozzles among the nozzles to perform a liquid process on the substrate. [Reference numerals] (2) Liquid process module; (3) Inspection module; (A2) Liquid process unit; (C1) Carrier block; (C2) Process block; (C3) Interface block; (C4) Exposing block; (C5) Inspection block
申请公布号 KR20130025826(A) 申请公布日期 2013.03.12
申请号 KR20120095423 申请日期 2012.08.30
申请人 TOKYO ELECTRON LIMITED 发明人 NAKASHIMA TOMOHIRO;INOUE SHIN;HARA YOSHITAKA;HASEGAWA IZUMI;OGATA KUNIE;MORI TAKUYA
分类号 H01L21/02 主分类号 H01L21/02
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