发明名称 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM |
摘要 |
PURPOSE: A substrate processing apparatus, a substrate processing method and a storage medium are provided to improve the process efficiency for substrates by using only the normal nozzle for a liquid process. CONSTITUTION: A liquid process unit(2) includes nozzles and a liquid process module(20). A transfer unit(4) moves a substrate to a process block. A monitoring unit detects the discharging state of the nozzles. A control unit selects normal nozzles among the nozzles to perform a liquid process on the substrate. [Reference numerals] (2) Liquid process module; (3) Inspection module; (A2) Liquid process unit; (C1) Carrier block; (C2) Process block; (C3) Interface block; (C4) Exposing block; (C5) Inspection block |
申请公布号 |
KR20130025826(A) |
申请公布日期 |
2013.03.12 |
申请号 |
KR20120095423 |
申请日期 |
2012.08.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NAKASHIMA TOMOHIRO;INOUE SHIN;HARA YOSHITAKA;HASEGAWA IZUMI;OGATA KUNIE;MORI TAKUYA |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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