| 摘要 |
PURPOSE: An apparatus for removing foreign materials from a plating solution strainer is provided to prevent surface defects such as plating stains by automatically cleaning strainers during pumping of plating solution. CONSTITUTION: An apparatus for removing foreign materials from a plating solution strainer comprises a filtering unit arranged in a circumferential direction and formed with holes(17,18,23,28,33,47) in which respective strainers are loaded, a driving unit which rotates and moves the filtering unit, a solution supply unit which is connected to one or more of the holes and supplies plating solution, and a foreign material removal liquid supply unit which is connected to one or more of the holes except for the holes connected to the solution supply unit and supplies foreign material removal liquid for removing foreign materials from the strainers. |
