MANUFACTURING METHOD OF ITO NANORODS USING RF MAGNETRON SPUTTERING

摘要

PURPOSE: A method for manufacturing ITO nanorods using RF magnetron sputtering is provided to cheaply produce a large amount of ITO nanorods at a low temperature. CONSTITUTION: A method for manufacturing ITO nanorods using RF magnetron sputtering comprises: a step of inserting a substrate into an RF magnetron sputtering chamber with an ITO target; and a step of outputting the substrate with the ITO nanorods from the chamber; and a step of performing thermal treatment at 230-270 deg. C for 30 minutes to two hours.