发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PURPOSE: A semiconductor device and a manufacturing method thereof are provided to improve the coupling efficiency between a control gate and a floating gate by surrounding the floating gate with the control gate. CONSTITUTION: A floating gate(FG) is formed along a vertical channel layer. The floating gate surrounds the vertical channel layer. A dielectric layer is formed along a tunnel insulating layer(225) and a sidewall of the floating gate. A multilayer control gate(CG) surrounds the floating gate. An interlayer insulating film is formed between the multilayered control gates.
|
申请公布号 |
KR20130024303(A) |
申请公布日期 |
2013.03.08 |
申请号 |
KR20110087668 |
申请日期 |
2011.08.31 |
申请人 |
SK HYNIX INC. |
发明人 |
WHANG, SUNG JIN;SHEEN, DONG SUN;PYI, SEUNG HO;KIM, MIN SOO |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|