发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device and a manufacturing method thereof are provided to improve the coupling efficiency between a control gate and a floating gate by surrounding the floating gate with the control gate. CONSTITUTION: A floating gate(FG) is formed along a vertical channel layer. The floating gate surrounds the vertical channel layer. A dielectric layer is formed along a tunnel insulating layer(225) and a sidewall of the floating gate. A multilayer control gate(CG) surrounds the floating gate. An interlayer insulating film is formed between the multilayered control gates.
申请公布号 KR20130024303(A) 申请公布日期 2013.03.08
申请号 KR20110087668 申请日期 2011.08.31
申请人 SK HYNIX INC. 发明人 WHANG, SUNG JIN;SHEEN, DONG SUN;PYI, SEUNG HO;KIM, MIN SOO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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