METHOD FOR OPTIMIZING PLASMA PROCESS

摘要

PURPOSE: A method for optimizing a plasma process is provided to monitor plasma reaction in real time by using a reference spectrum and a measurement spectrum. CONSTITUTION: A reference spectrum is obtained from plasma reaction in a chamber(S10). A generalized measurement spectrum and a generalized reference standard value are calculated(S40). The generalized measurement spectrum is compared with the generalized reference spectrum(S50). The generalized measurement value is compared with the generalized reference standard value(S70). Whether a process parameter of plasma reaction is changed or a chamber is cleaned(S80) is determined. [Reference numerals] (AA) Start; (BB,DD,FF) No; (CC,EE,GG) Yes; (HH) End; (S10) Obtaining a reference spectrum; (S100) Seasoning step; (S20) Calculating and storing a generalized reference spectrum and a generalized reference standard value; (S30) Obtaining a measurement spectrum; (S40) Calculating a generalized measurement spectrum and a generalized measurement standard value; (S50) Is the generalized measurement spectrum matched with the generalized reference spectrum?; (S60) Is the monitoring of a plasma reaction terminated?; (S70) Is the generated measurement standard value matched with the generalized reference spectrum?; (S80) Changing a process parameter; (S90) Cleaning a chamber, exchanging parts