发明名称 PHOTOSENSITIVE COMPOSITION, COMPOUND USED IN THE SAME, AND PATTERNING METHOD USING THE SAME
摘要 A photosensitive composition, comprises (A) a sulfonium salt represented by formula (I); <CHEM> wherein Y1, Y2 and Y3 each independently represents a nitrogen-containing heteroaryl group, an alkyl group, a cycloalkyl group, an aryl group or an alkenyl group, at least one of Y1, Y2 and Y3 represents a nitrogen-containing heteroaryl group, and at least two of Y1, Y2 and Y3 may combine with each other to form a ring; X<n-> represents an n-valent non-nucleophilic anion; and n represents an integer of 1 to 3.
申请公布号 KR101238322(B1) 申请公布日期 2013.03.08
申请号 KR20050032609 申请日期 2005.04.20
申请人 发明人
分类号 C07D207/48;C07D209/30;G03F7/004;G03F7/038;G03F7/039;G03F7/075;G03F7/20;H01L21/027 主分类号 C07D207/48
代理机构 代理人
主权项
地址